Ogilvy PR Strengthens Technology Practice; With Louise Kehoe and Dan La Russo

ogilvy public relations

Ogilvy Public Relations Worldwide (Ogilvy PR) appointed Louise Kehoe and Dan La Russo to the roles of Co-Leaders of the Western region of the agency’s U.S. Technology Practice. Both professionals were already members of the Ogilvy family.

Dan La Russo has been a member of Ogilvy PR’s technology practice for more than 10 years. His client experience includes the development of strategy and communications programs for Hitachi Data Systems, Crosswalk, Inc, the Storage Networking Industry Association, Sun Microsystems (Storage and Services divisions), LEGATO Software as well as Intel, Qwest Communications, Level 3 Communications and several other technology brands. In his new role, La Russo will be responsible for overseeing staffing levels and assignments, and identifying the skill-sets and expertise that should be added to the Practice in order to deliver optimal client service and keep the agency well positioned for future growth.

Louise Kehoe has more than 20 years journalistic experience, covering all aspects of the tech industry for Financial Times. Four years at Ogilvy PR (San Francisco) working with tech industry and corporate clients, recommended her for the job. In her new role, Kehoe will focus on growing the Technology Practice on the West Coast drawing upon her deep background in the technology sector and her ability to span the corporate, consumer, public affairs, social and vertical sector PR requirements of clients.

“Louise and Dan bring our clients exactly that kind of integrated thinking, and as a result, they are playing instrumental roles in growing and strengthening our U.S. Technology Practice,” said Amy Messenger, Ogilvy PR’s U.S. Technology Practice Leader.

Ogilvy PR’s global technology practice serves clients in 10 specialty market segments including digital lifestyle, IT infrastructure and services, clean tech and renewable energies, and web 2.0.

Leave a Reply

Your email address will not be published. Required fields are marked *